等离子物理气相沉积热障涂层研究进展

石佳; 魏亮亮; 张宝鹏; 高丽华; 郭洪波; 宫声凯; 徐惠彬

doi:10.11868/j.issn.1005-5053.2018.001008

等离子物理气相沉积热障涂层研究进展

doi: 10.11868/j.issn.1005-5053.2018.001008

石佳¹,
魏亮亮¹,
张宝鹏¹,
高丽华¹,
郭洪波^1,2, ,,
宫声凯^1,2,
徐惠彬^1,2

1.
北京航空航天大学材料科学与工程学院，北京 100191
2.
高温结构材料与涂层技术工业和信息化部重点实验室，北京 100191

基金项目: 国家自然基金（51590894, 51425102, 51231001）

详细信息

通讯作者:
郭洪波（1971—），男，博士，教授，主要从事高温防护涂层研究，（E-mail）guo.hongbo@buaa.edu.cn

中图分类号: TG174.4
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出版历程
- 收稿日期: 2018-01-10
- 修回日期: 2018-02-10
- 刊出日期: 2018-04-01

Research Process in Plasma Spray Physical Vapor Deposited Thermal Barrier Coatings

1.
School of Materials Science and Engineering, Beihang University, Beijing 100191, China
2.
Key Laboratory of High-Temperature Structure Materials and Coatings Technology （Ministry of Industry and Information Technology）, Beihang University, Beijing 100191, China

摘要

摘要: 等离子物理气相沉积（plasma spray-physical vapor deposition，PS-PVD）是一种最近发展的功能薄膜与涂层制备技术。该技术结合了等离子喷涂（PS）和物理气相沉积（PVD）两种技术的特点，可以实现气、液、固多相的快速共沉积，进行涂层/薄膜微结构的高度柔性加工，并可实现复杂工件遮蔽区域的非视线均匀沉积，在热障涂层、环境障涂层、超硬耐磨涂层、透氧膜和电极膜等领域具有广阔的应用前景，被认为代表了高性能热/环境障涂层制备技术的发展方向。本文综述了PS-PVD的工作原理、技术特点以及近年来国内外在PS-PVD热障涂层制备科学和沉积机理等方面的研究进展，展望了新型高性能热障涂层制备技术的研究热点及未来的发展方向。
- 等离子物理气相沉积（PS-PVD） /
- 热障涂层 /
- 工艺 /
- 沉积机理
Abstract: Plasma spray physical vapor deposition (PS-PVD) is a newly developed processing technology for advanced functional coatings and films. PS-PVD is featured with the advantages of plasma spray (PS) and physical vapor deposition (PVD) and can be used for high efficient co-deposition of vapor phases, liquid droplets and solid particles, with the capability of highly flexibility in building up various microstructure architectures. Besides, uniform deposition of the coatings or films can be achieved by this technology even on the non-line-of-sight areas of those components with complex geometry. Owing to the above merits, PS-PVD shows very promising potential in the fields of thermal barrier coatings (TBCs), environmental barrier coatings (EBCs), super-hard and wear-resistant coatings or films, oxygen permeable membranes and electrode membranes. Further, PS-PVD is recognized as the processing technology for advanced TBCs in the future. In this paper, physical principles and recent research progress in preparation and deposition mechanisms of PS-PVD TBCs are briefly introduced and summarized. The future development trends of PS-PVD in new thermal barrier coatings are prospected.
- PS-PVD /
- thermal barrier coatings (TBCs) /
- processing /
- deposition mechanisms

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图 1 PS-PVD设备示意图

Figure 1. Scheme of PS-PVD equipment

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图 2 三种工艺的等离子射流比较^[14]

Figure 2. Comparison of plasma plume in three different processes^[14]　（a）APS;（b）LPPS;（c）PS-PVD

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图 3 不同组分工作气体下的PS-PVD等离子射流状态^[18]　（a）无粉末注入;（b）有YSZ粉末注入

Figure 3. Photographs of PS-PVD plasma plume using different gas compositions^[18]　（a）without any powder;（b）with YSZ powder injected

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图 4 不同工作气体比例下PS-PVD热障涂层截面形貌^[8]　（a）Ar/He 1∶1;（b）Ar/He 2∶1

Figure 4. Microstructures of PS-PVD thermal barrier coatings with different plasma gas Ar/He ratio^[8]　（a）1∶1;（b）2∶1

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图 5 不同等离子气体组成下喷枪内YSZ获得的净焓值^[19]

Figure 5. Calculated results of net enthalpy transferred by plasma gas Ar/He of different ratios to representative YSZ particle inside nozzle^[19]

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图 6 不同功率下可完全气化的粉末颗粒尺寸^[20]

Figure 6. Predicted evaporated feedstock particle size^[20]

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图 7 不同真空度下PS-PVD热障涂层结构^[21]

Figure 7. Microstructures of PS-PVD thermal barrier coatings under different work chamber pressures^[21]　（a）5000 Pa；（b）> 500 Pa；（c）< 300 Pa；（d）< 1 Pa

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图 8 喷涂粉末吸收的有效功率^[20]

Figure 8. Effective power utilized by powder feedstock^[20]

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图 9 喷涂过程中YSZ喷涂粉末的飞行轨迹模型^[9]

Figure 9. Flight model of YSZ powder during spraying^[9]

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图 10 YSZ不同结构涂层形貌^[27]　（a）致密结构;（b）混合结构;（c）准柱状结构;（d）纯柱状结构

Figure 10. Cross-section morphologies of YSZ coatings with different structures^[27]　（a）lamellar structure;（b）hybrid structure;（c）quasi-columnar structure;（d）columnar structure

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图 11 喷涂粉末熔化气化示意图及液相沉积为主时的层状结构涂层生长模型^[27]

Figure 11. Growth model of dense microstructure deposited mainly from liquid droplets^[27]

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图 12 气/液混合沉积时混合结构涂层生长模型^[27]　（a）初期;（b）涂层生长;（c）完整涂层

Figure 12. Growth model of hybrid coating deposited from vapor phase and liquid droplets^[27]　（a）initial stage;（b）growth stage;（c）complete coating

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图 13 PS-PVD准柱状涂层的沉积模型^[28]

Figure 13. Deposition model of quasi-columnar coating in PS-PVD^[28]

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图 14 单一纯气相沉积柱状晶结构涂层生长模型^[27]　（a）气相原子吸附;（b）形核过程;（c）稳定岛状结构;（d）早期柱状晶;（e）柱状晶生长;（f）完整涂层

Figure 14. Growth model of columnar coating deposited from pure vapor phase^[27]　（a）absorption;（b）nucleation;（c）stable islands;（d）early columnar;（e）growth of column; (f) complete coating

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表 1 相同净功率下不同气体组分的温度和焓值^[18]

Table 1. Plasma temperatures and enthalpies of different plasma gas compositions at the same plasma net power^[18]

Plasma gas flow/SLPM	Molar flow /（mol·min^–1）	Net power/kW	Enthalpy/（J·mol^–1）	Temperature/K
100Ar, 10H₂	4908	60	733496	12860
35Ar, 60 He	4291	60	838965	15550
35Ar, 60 He, 10 H₂	4685	60	768410	14240
Note：SLPM—standard liters per minute

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